News Releases

Date Title and Summary
Toggle Summary KLA-Tencor Advances Production Capabilities With Answer! for HRP-220 High-Resolution Profiler
KLA-Tencor Advances Production Capabilities With Answer! for HRP-220 High-Resolution Profiler San Jose, CA, July 13, 1998- KLA-Tencor Corp. (Nasdaq:KLAC) today introduced the HRP-220, the latest model in the company's HRP-2XX series of surface profilers for semiconductor applications.
Toggle Summary KLA-Tencor Is First in Industry to Achieve Level 2 in SEI's Software Capability Maturity Model
KLA-Tencor Is First in Industry to Achieve Level 2 in SEI's Software Capability Maturity Model San Jose, CA, January 6, 1999 - KLA-Tencor Corp. (Nasdaq: KLAC) today announced it is the first semiconductor equipment company to reach Level 2 on the Software Engineering Institute's five-level
Toggle Summary KLA-Tencor Acquires Ultrapointe Business from Uniphase
KLA-Tencor Acquires Ultrapointe Business from Uniphase San Jose, CA, January 7, 1999 - KLA-Tencor Corporation (Nasdaq: KLAC) and Uniphase Corporation (Nasdaq:UNPH) today announced that KLA-Tencor has acquired the assets of the Ultrapointe subsidiary of Uniphase.
Toggle Summary KLA-Tencor Announces Continuation of Systematic Repurchase Plan for Shares of Common Stock
KLA-Tencor Announces Continuation of Systematic Repurchase Plan for Shares of Common Stock San Jose, CA, January 11, 1999 - KLA-Tencor Corporation today announced that it is continuing its systematic repurchase plan with a repurchase of an additional 250,000 shares of its common stock on the open
Toggle Summary KLA-Tencor Reports Operating Results for Second Quarter
KLA-Tencor Reports Operating Results for Second Quarter San Jose, CA, January 19, 1999 - KLA-Tencor Corporation today announced operating results for its second quarter ended December 31, 1998. Revenues were $193 million compared to $326 million for the December quarter of 1997.
Toggle Summary KLA-Tencor First to Automate After-Develop Inspection for Macro Defects
Automation of previously manual inspection step adds important new capabilities to advanced pattern transfer optimization solution
Toggle Summary KLA-Tencor's Advanced CD SEM Addresses New Metrology Challenges for Low k1 Photolithography
The 8100XP-R Enhances KLA-Tencor's Advanced Pattern Transfer Optimization Solution
Toggle Summary KLA-Tencor Reports Operating Results for Third Quarter
KLA-Tencor Reports Operating Results for Third Quarter San Jose, CA, April 14, 1999 - KLA-Tencor Corporation today announced operating results for its third quarter ended March 31, 1999. Revenues were $211 million compared to $274 million for the March quarter of 1998.
Toggle Summary KLA-Tencor Introduces Advanced Reticle Contamination Inspection System for DUV Lithography
KLA-Tencor Introduces Advanced Reticle Contamination Inspection System for DUV Lithography San Jose, CA, April 16, 1999 - KLA-Tencor Corp. (Nasdaq:KLAC) today introduced the industry's first ultraviolet-based reticle contamination inspection system designed to detect contaminants unique to deep
Toggle Summary KLA-Tencor Introduces Overlay Metrology System for 0.13-Micron Design Rules
5300 Tool Enables Lithography Engineers to Tighten Overlay Budgets and Increase Yields