KLA-Tencor Introduces New High Numerical Aperture Reticle Inspection Tool for 0.18-Micron Production and Early 0.13-Micron Development San Jose, CA, JULY 12, 1999 - KLA-Tencor Corp. (Nasdaq: KLAC) today unveiled the 365UV-HR-its new high numerical aperture (NA) reticle pattern inspection tool for
KLA-Tencor Introduces First On-Line, High Resolution KLA-Tencor Introduces First On-Line, High Resolution Sizing Module for Improved Semiconductor Yield Prediction San Jose, CA, June 3, 1999 - KLA-Tencor Corp. (Nasdaq: KLAC) today introduced its new automatic defect classification (ADC) sizing
KLA-Tencor Introduces Advanced Reticle Contamination Inspection System for DUV Lithography San Jose, CA, April 16, 1999 - KLA-Tencor Corp. (Nasdaq:KLAC) today introduced the industry's first ultraviolet-based reticle contamination inspection system designed to detect contaminants unique to deep
KLA-Tencor Reports Operating Results for Third Quarter San Jose, CA, April 14, 1999 - KLA-Tencor Corporation today announced operating results for its third quarter ended March 31, 1999. Revenues were $211 million compared to $274 million for the March quarter of 1998.