Utilizing innovative Dual Imaging technology, the Teron 640 inspection system offers the sensitivity necessary for mask shops to accurately qualify advanced optical masks. The Teron SL655 inspection system introduces new STARlightGold™ technology, helping IC manufacturers assess incoming reticle quality, monitor reticle degradation and detect yield-critical reticle defects. The comprehensive reticle quality measurements produced by the Teron inspectors are supported by RDC, a data analysis and management system that provides a wide array of capabilities that drive automated defect disposition decisions, improve cycle time and reduce the reticle-related patterning errors that can affect yield.
"Today's complex patterning techniques, such as spacer assist quadruple patterning (SAQP), utilize increasingly complex masks, making it crucial to qualify and maintain the reticle state to achieve optimal wafer patterning," stated
Built on the industry-leading Teron reticle inspection platform for mask shops, the Teron 640 supports inspection of advanced optical masks through the utilization of 193nm illumination with Dual Imaging mode—a combination of high resolution inspection and aerial imaging with printability-based defect dispositioning. Additionally, the Teron 640 includes enhancements to advanced die-to-database inspection algorithms to further maximize defect sensitivity as well as a new higher throughput option to decrease time to results. Multiple Teron 640 reticle inspection systems have been installed at foundry and logic manufacturers where they are being used for high-performance reticle quality control.
The Teron SL655's core technology, STARlightGold, generates a golden reference from the mask at incoming quality check and then uses this reference for mask re-qualification inspections. The unique technology enables full-field reticle coverage and maximizes the detection of defects, such as haze growth or contamination, on a full range of mask types, including those that utilize highly complicated optical proximity techniques. The Teron SL655's industry-leading production throughput supports the fast cycle times required to qualify the increased number of reticles associated with advanced multi-patterning techniques. In addition, the Teron SL655 is EUV-compatible, allowing collaboration with IC manufacturers on in-fab EUV reticle inspection requirements. Teron SL655 systems are under evaluation with IC manufacturers for incoming reticle quality control and reticle re-qualification during chip production.
RDC is a comprehensive data analysis and storage platform that supports multiple
The Teron 640, Teron SL655 and RDC join the LMS IPRO6 reticle pattern placement metrology system and K-T Analyzer® advanced data analysis system in providing a comprehensive reticle qualification solution for advanced mask and IC manufacturers. The Teron 640, Teron SL655 and RDC are also critical components in
Forward Looking Statements:
Statements in this press release other than historical facts, such as statements regarding the expected performance of the Teron 640 and Teron SL655 reticle inspection systems and the Reticle Decision Center; the extendibility of the Teron 640 and Teron SL655 reticle inspection systems and Reticle Decision Center to future technology nodes; trends in the semiconductor industry and the anticipated challenges associated with them; expected uses of the Teron 640 and Teron SL655 reticle inspection systems and Reticle Decision Center by
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